Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting
Chen, Q., Hubbard, G., Shields, P. A., Liu, C., Allsopp, D. W. E., Wang, W. N. and Abbott, S., 2009. Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting. Applied Physics Letters, 94 (26), 263118.
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Subwavelength scale antireflection moth-eye structures in silicon were fabricated by a wafer-scale nanoimprint technique and demonstrated an average reflection of 1% in the spectral range from 400 to 1000 nm at normal incidence. An excellent antireflection property out to large incident angles is shown with the average reflection below 8% at 60 degrees. Pyramid array gave an almost constant average reflection of about 10% for an incident angle up to 45 degrees and concave-wall column array produced an approximately linear relation between the average reflection and the incident angles. The technique is promising for improving conversion efficiencies of silicon solar cells.
|Creators||Chen, Q., Hubbard, G., Shields, P. A., Liu, C., Allsopp, D. W. E., Wang, W. N. and Abbott, S.|
|Uncontrolled Keywords||elemental semiconductors, antireflection coatings, solar cells, nanolithography, silicon|
|Departments||Faculty of Engineering & Design > Electronic & Electrical Engineering|
Faculty of Engineering & Design > Mechanical Engineering
|Research Centres||Centre for Advanced Sensor Technologies (CAST)|
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