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Advances in nano-enabled GaN photonic devices


Reference:

Wang, W. N., Shields, P. A., Liu, C., Allsopp, D. W. E. and Causa, F., 2011. Advances in nano-enabled GaN photonic devices. Proceedings of SPIE - The International Society for Optical Engineering, 7945, 794523.

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Official URL:

http://dx.doi.org/10.1117/12.871427

Abstract

In this work, the results are presented of a nanorod LED array. If the lateral size of the nanorods is small enough, it is possible to achieve a degree of lateral confinement. If the nanorods are ordered into a suitable photonic lattice, then this will reduce the lateral spontaneous emission and enhance emission along the vertical axis via the Purcell effect. Additionally there is a degree of dislocation filtering that can occur [1]. However, one potential drawback of this device is the large free surface that borders the multi-quantum well active region. Nevertheless, it has been shown that the surface recombination in the nitride materials is the lowest of all III-V semiconductors. Results of SEM, PL, EL, and far field pattern are presented to compare the progressive effect of using photo-assisted electroless and wet etching [2]. It can be seen that over time the photo-assisted electroless method clearly delineates the active MQW region, possibly as a result of the different etch rate of InGaN. Alternatively, a purely chemical etching method was used. With a narrowing of the nanorods, there is a progressive blue shift of the photoluminescence peak. The optical image of the emission shows that there are well-defined lines of enhanced light propagation that match the symmetry of the nanorod array, thus showing there is a photonic crystal effect.

Details

Item Type Articles
CreatorsWang, W. N., Shields, P. A., Liu, C., Allsopp, D. W. E. and Causa, F.
DOI10.1117/12.871427
DepartmentsFaculty of Engineering & Design > Electronic & Electrical Engineering
Faculty of Engineering & Design > Mechanical Engineering
RefereedYes
StatusPublished
ID Code24182
Additional InformationQuantum Sensing and Nanophotonic Devices VIII. 23-27 January 2011. San Francisco, CA, United States.

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