Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface
Fernandez-Martin, C., Roser, S. J. and Edler, K. J., 2008. Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface. Journal of Materials Chemistry, 18 (11), pp. 1222-1231.
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Spontaneous growth of non-ionic surfactant-templated thin films at the air-water interface was investigated using three techniques: Brewster angle microscopy (BAM), time-resolved off-specular X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). Experiments were also carried out to study the evolution of micelles in the subphase solution using small-angle neutron scattering ( SANS). Films were prepared in acidic conditions using octaethylene glycol mono-n-hexadecyl ether (C16EO8) as the surfactant and tetramethyloxysilane ( TMOS) as the silica precursor. Three different TMOS-C16EO8 molar ratios (3.5, 7.1 and 10.8) were studied. Variation of the silica-precursor concentration causes a significant effect on the film-formation time, the solution and film-growth mechanisms and the final film structure.
|Creators||Fernandez-Martin, C., Roser, S. J. and Edler, K. J.|
|Departments||Faculty of Science > Chemistry|
|Additional Information||ID number: ISI:000253751600009|
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