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Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface


Reference:

Fernandez-Martin, C., Roser, S. J. and Edler, K. J., 2008. Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface. Journal of Materials Chemistry, 18 (11), pp. 1222-1231.

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Official URL:

http://dx.doi.org/10.1039/b716662a

Abstract

Spontaneous growth of non-ionic surfactant-templated thin films at the air-water interface was investigated using three techniques: Brewster angle microscopy (BAM), time-resolved off-specular X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). Experiments were also carried out to study the evolution of micelles in the subphase solution using small-angle neutron scattering ( SANS). Films were prepared in acidic conditions using octaethylene glycol mono-n-hexadecyl ether (C16EO8) as the surfactant and tetramethyloxysilane ( TMOS) as the silica precursor. Three different TMOS-C16EO8 molar ratios (3.5, 7.1 and 10.8) were studied. Variation of the silica-precursor concentration causes a significant effect on the film-formation time, the solution and film-growth mechanisms and the final film structure.

Details

Item Type Articles
CreatorsFernandez-Martin, C., Roser, S. J. and Edler, K. J.
DOI10.1039/b716662a
DepartmentsFaculty of Science > Chemistry
RefereedYes
StatusPublished
ID Code4507
Additional InformationID number: ISI:000253751600009

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