Synthesis, thermal decomposition pattern and single crystal X-ray studies of dimeric [Cu(dmae)(OCOCH3)(H2O)](2): A precursor for the aerosol assisted chemical vapour deposition of copper metal thin films

Reference:

Mazhar, M., Hussain, S. M., Rabbani, F., Kociok-Kohn, G. and Molloy, K. C., 2006. Synthesis, thermal decomposition pattern and single crystal X-ray studies of dimeric [Cu(dmae)(OCOCH3)(H2O)](2): A precursor for the aerosol assisted chemical vapour deposition of copper metal thin films. Bulletin of the Korean Chemical Society, 27 (10), pp. 1572-1576.

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Abstract

A dimeric precursor, [Cu(dmae)(OCOCH3)(H2O)](2) for the CVD of copper metal films, (dmaeH = N,N-dimethylaminoethanol) was synthesized by the reaction of copper(II) acetate monohydrate (Cu(OCOCH3)(2). H2O) and dmaeH in toluene. The product was characterized by m.p. determination, elemental analysis and Xray crystallography. Molecular structure of [Cu(dmae)(OCOCH3)(H2O)](2) shows that a dimeric unit [Cu(dmae)(OCOCH3)(H2O)](2) is linked to another through hydrogen bond and it undergoes facile decomposition at 300 degrees C to deposit granular copper metal film under nitrogen atmosphere. The decomposition temperature, thermal behaviour, kinetic parameters, evolved gas pattern of the complex, morphology, and the composition of the film were also investigated.

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