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Atmospheric-pressure chemical vapor deposition of group IVb metal phosphide thin films from tetrakisdimethylamidometal complexes and cyclohexylphosphine


Reference:

Blackman, C. S., Carmalt, C. J., O'Neill, S. A., Parkin, I. P., Apostolico, L. and Molloy, K. C., 2004. Atmospheric-pressure chemical vapor deposition of group IVb metal phosphide thin films from tetrakisdimethylamidometal complexes and cyclohexylphosphine. Chemistry of Materials, 16 (6), pp. 1120-1125.

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Abstract

The dual-source atmospheric-pressure chemical vapor deposition of group IVb metal phosphide films from tetrakisdimethylamido(metal) and cyclohexylphosphine precursors is presented. Deposition took place at low temperatures (

Details

Item Type Articles
CreatorsBlackman, C. S., Carmalt, C. J., O'Neill, S. A., Parkin, I. P., Apostolico, L. and Molloy, K. C.
DepartmentsFaculty of Science > Chemistry
RefereedYes
StatusPublished
ID Code4946
Additional InformationID number: ISI:000220304100024

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