Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition
Reference:
Blackman, C. S., Carmalt, C. J., Manning, T. D., Parkin, I. P., Apostolico, L. and Molloy, K. C., 2004. Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition. Applied Surface Science, 233 (1-4), pp. 24-28.
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Abstract
Thin films of crystalline chromium phosphide (CrP) have been produced from the dual-source atmospheric pressure CVD reaction of chromium hexacarbonyl and cyclohexylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented. (C) 2004 Elsevier B.V. All rights reserved.
Details
| Item Type | Articles |
| Creators | Blackman, C. S., Carmalt, C. J., Manning, T. D., Parkin, I. P., Apostolico, L. and Molloy, K. C. |
| DOI | 10.1016/j.apsusc.2004.04.010 |
| Departments | Faculty of Science > Chemistry |
| Refereed | Yes |
| Status | Published |
| ID Code | 4947 |
| Additional Information | ID number: ISI:000222497700005 |
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