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Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition


Reference:

Blackman, C. S., Carmalt, C. J., Manning, T. D., Parkin, I. P., Apostolico, L. and Molloy, K. C., 2004. Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition. Applied Surface Science, 233 (1-4), pp. 24-28.

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Abstract

Thin films of crystalline chromium phosphide (CrP) have been produced from the dual-source atmospheric pressure CVD reaction of chromium hexacarbonyl and cyclohexylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented. (C) 2004 Elsevier B.V. All rights reserved.

Details

Item Type Articles
CreatorsBlackman, C. S., Carmalt, C. J., Manning, T. D., Parkin, I. P., Apostolico, L. and Molloy, K. C.
DOI10.1016/j.apsusc.2004.04.010
DepartmentsFaculty of Science > Chemistry
RefereedYes
StatusPublished
ID Code4947
Additional InformationID number: ISI:000222497700005

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