Chemical vapour deposition of crystalline thin films of tantalum phosphide
Reference:
Blackman, C. S., Carmalt, C. J., Parkin, I. P., O'Neill, S. A., Molloy, K. C. and Apostolico, L., 2003. Chemical vapour deposition of crystalline thin films of tantalum phosphide. Materials Letters, 57 (18), pp. 2634-2636.
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Abstract
Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.
Details
| Item Type | Articles |
| Creators | Blackman, C. S., Carmalt, C. J., Parkin, I. P., O'Neill, S. A., Molloy, K. C. and Apostolico, L. |
| DOI | 10.1016/s0167-577x(02)01341-1 |
| Departments | Faculty of Science > Chemistry |
| Refereed | Yes |
| Status | Published |
| ID Code | 5069 |
| Additional Information | ID number: ISI:000182776500003 |
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