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Chemical vapour deposition of crystalline thin films of tantalum phosphide


Reference:

Blackman, C. S., Carmalt, C. J., Parkin, I. P., O'Neill, S. A., Molloy, K. C. and Apostolico, L., 2003. Chemical vapour deposition of crystalline thin films of tantalum phosphide. Materials Letters, 57 (18), pp. 2634-2636.

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Abstract

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.

Details

Item Type Articles
CreatorsBlackman, C. S., Carmalt, C. J., Parkin, I. P., O'Neill, S. A., Molloy, K. C. and Apostolico, L.
DOI10.1016/s0167-577x(02)01341-1
DepartmentsFaculty of Science > Chemistry
RefereedYes
StatusPublished
ID Code5069
Additional InformationID number: ISI:000182776500003

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