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ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material


Reference:

Zhirnov, E., Stepanov, S., Gott, A., Wang, W. N., Shreter, Y. G., Tarkhin, D. V. and Bochkareva, N. I., 2005. ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material. Journal of Vacuum Science & Technology A, 23 Jul-Aug (4), pp. 687-692.

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Details

Item Type Articles
CreatorsZhirnov, E., Stepanov, S., Gott, A., Wang, W. N., Shreter, Y. G., Tarkhin, D. V. and Bochkareva, N. I.
DepartmentsFaculty of Engineering & Design > Electronic & Electrical Engineering
Research CentresCentre for Advanced Sensor Technologies (CAST)
RefereedYes
StatusPublished
ID Code8820
Additional InformationID number: ISI:000230717200022

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