ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material
Reference:
Zhirnov, E., Stepanov, S., Gott, A., Wang, W. N., Shreter, Y. G., Tarkhin, D. V. and Bochkareva, N. I., 2005. ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material. Journal of Vacuum Science & Technology A, 23 Jul-Aug (4), pp. 687-692.
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Details
| Item Type | Articles |
| Creators | Zhirnov, E., Stepanov, S., Gott, A., Wang, W. N., Shreter, Y. G., Tarkhin, D. V. and Bochkareva, N. I. |
| Departments | Faculty of Science > Physics |
| Refereed | Yes |
| Status | Published |
| ID Code | 8820 |
| Additional Information | ID number: ISI:000230717200022 |
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