Influence of cathode material and SiCl4 gas on inductively coupled plasma etching of AlGaN layers with Cl-2/Ar plasma
Reference:
Zhirnov, E., Stepanov, S., Wang, W. N., Shreter, Y. G., Takhin, D. V. and Bochkareva, N. I., 2004. Influence of cathode material and SiCl4 gas on inductively coupled plasma etching of AlGaN layers with Cl-2/Ar plasma. Journal of Vacuum Science & Technology A, 22 Nov-Dec (6), pp. 2336-2341.
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Details
| Item Type | Articles |
| Creators | Zhirnov, E., Stepanov, S., Wang, W. N., Shreter, Y. G., Takhin, D. V. and Bochkareva, N. I. |
| Departments | Faculty of Science > Physics |
| Refereed | Yes |
| Status | Published |
| ID Code | 8912 |
| Additional Information | ID number: ISI:000225505900020 |
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