Research

Fine tuning of the dichroic behavior of Bragg reflectors based on anisotropically nanostructured silicon


Reference:

Diener, J., Kunzner, N., Kovalev, D., Gross, E., Koch, F. and Fujii, M., 2003. Fine tuning of the dichroic behavior of Bragg reflectors based on anisotropically nanostructured silicon. Physica Status Solidi A: Applications and Materials Science, 197 (2), pp. 582-585.

Related documents:

This repository does not currently have the full-text of this item.
You may be able to access a copy if URLs are provided below.

Abstract

Electro-chemical etching of heavily doped, (110) oriented, p(+) (boron) doped silicon wafers results in porous silicon (PSi) layers which exhibit a strong in-plane anisotropy of the refractive index (birefringence). Single- and multiple layers of anisotropically nanostructured silicon (Si) have been fabricated and studied by polarization-resolved reflection and transmission measurements. Dielectric stacks of birefringent PSi acting as distributed Bragg reflectors have two distinct reflection bands depending on the polarization of the incident linearly polarized light. This effect is caused by a three-dimensional (in plane and in-depth) variation of the refraction index. The possibility of fine tuning the two orthogonally polarized reflection bands and their spectral splitting is demonstrated.

Details

Item Type Articles
CreatorsDiener, J., Kunzner, N., Kovalev, D., Gross, E., Koch, F. and Fujii, M.
DOI10.1002/pssa.200306566
DepartmentsFaculty of Science > Physics
RefereedYes
StatusPublished
ID Code9062
Additional InformationID number: ISI:000183219500054

Export

Actions (login required)

View Item