Highly sensitive recognition element based on birefringent porous silicon layers
Reference:
Gross, E., Kovalev, D., Kunzner, N., Timoshenko, V. Y., Diener, J. and Koch, F., 2001. Highly sensitive recognition element based on birefringent porous silicon layers. Journal of Applied Physics, 90 (7), pp. 3529-3532.
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Abstract
Anisotropically nanostructured silicon layers exhibit a strong in-plane birefringence. Their optical anisotropy parameters are found to be extremely sensitive to the presence of dielectric substances inside of the pores. Polarization-resolved transmittance measurements provide an extremely sensitive tool to analyze the adsorption of various atoms and molecules in negligible quantities. A variation of the transmitted linearly polarized light intensity up to two orders of magnitude combined with a fast optical response in the range of seconds make these layers a good candidate for sensor applications. (C) 2001 American Institute of Physics.
Details
| Item Type | Articles |
| Creators | Gross, E., Kovalev, D., Kunzner, N., Timoshenko, V. Y., Diener, J. and Koch, F. |
| Departments | Faculty of Science > Physics |
| Refereed | Yes |
| Status | Published |
| ID Code | 9252 |
| Additional Information | ID number: ISI:000171135900064 |
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